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We need the following material: Positive photoresist for KrF

Product Name: Positive photoresist for KrF CAS Number: None Required Amount: No Info Other Information: Target Film Thickness: Approx. several hundred nm to 500 nmTarget Pattern: Periodic structures on the order of several hundred nm (intended for interference lithography)Substrate / Coating Surface: Cr film, Silicon, Glass, Sapphire, etc.1.Sensitivity and Contrast: Although there are no specific […]

We need the following material: BARC //Bottom Anti-Reflective Coating

Product Name: BARC //Bottom Anti-Reflective Coating CAS Number: None Required Amount: No Info Other Information: used in KrF lithography/interference lithography

We need the following material: TARC //Top Anti-Reflective Coating

Product Name: TARC //Top Anti-Reflective Coating CAS Number: None Required Amount: No Info Other Information: used in KrF lithography/interference lithography

We need the following material: P-6FDAP//Benzamide, N,N’-[[2,2,2-trifluoro-1-(trifluoromethyl)ethylidene]bis(6-hydroxy-3,1-phenylene)]bis[4-amino CAS 129197-38-2

Product Name: P-6FDAP//Benzamide, N,N’-[[2,2,2-trifluoro-1-(trifluoromethyl)ethylidene]bis(6-hydroxy-3,1-phenylene)]bis[4-amino CAS Number: 129197-38-2 Required Amount: 1kg Other Information: None

We need the following material: 1-ethylcyclopentyl acrylate CAS 326925-69-3

Product Name: 1-ethylcyclopentyl acrylateCAS Number: 326925-69-3Required Amount: 100kgOther Information: 99.5%

We need the following material: Dicyclopentanyl Acrylate CAS 7398-56-3

Product Name: Dicyclopentanyl Acrylate CAS Number: 7398-56-3 Required Amount: 5kg Other Information: Purity: 95%min

We need the following material: Octahydro-1H-4,7-methanoinden-5-yl methacrylate (stabilized with MEHQ) CAS 34759-34-7

Product Name: Octahydro-1H-4,7-methanoinden-5-yl methacrylate (stabilized with MEHQ) CAS Number: 34759-34-7 Required Amount: 5kg Other Information: Purity: 95%min

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